Volume 4 Number 3 (June 2013)
IJESD 2013 Vol.4(3): 331-335 ISSN: 2010-0264
DOI: 10.7763/IJESD.2013.V4.365

Cu and Cd induced Cytotoxicity Involving Lipid Peroxidation and Sulfhydryl Compounds in the Hyperaccumulator and Nonaccumulator Varieties of Commelina Communis

Haiou Wang
Abstract—The ability to accumulate Cu and Cd was investigated in Cu hyperaccumulator and nonaccumulator varieties of Commelina communis. Furthermore, the role of malondialdehyde (MDA), glutathione (GSH), and phytochelatin (PC) in the detoxification mechanisms used by the hyperaccumulator C. communis to cope with heavy metals were investigated. Results showed that Cu and Cd contents of both leaves and roots in the hyperaccumulator were higher than those in the nonaccumulator. However, the hyperaccumulator variety could have a more powerful ability to transport Cu and Cd from roots to shoots, thus decreasing the toxicity risk. Meanwhile, the MDA, GSH, and PC contents in the hyperaccumulator were significantly lower than those in the nonaccumulator under Cu and Cd stress, indicating that the former can utilize these sulfhydryl compounds to reduce toxicity caused by metal ions. Thus, the hyperaccumulator can tolerate heavy metal-induced toxicity better than the nonaccumulator.

Index Terms—Heavy metals, malondialdehyde, glutathione, phytochelatin.

Haiou Wang is with the Department of Biological Science and Engineering, School of Chemical and Biological Engineering, University of Science and Technology Beijing, Beijing, China (email: wanghaiou@ustb.edu.cn).

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Cite:Haiou Wang, "Cu and Cd induced Cytotoxicity Involving Lipid Peroxidation and Sulfhydryl Compounds in the Hyperaccumulator and Nonaccumulator Varieties of Commelina Communis," International Journal of Environmental Science and Development vol. 4, no. 3, pp. 页码, 2013.





 General Information

  • ISSN: 2010-0264 (Print); 2972-3698 (Online)
  • Abbreviated Title: Int. J. Environ. Sci. Dev.
  • Frequency: Bimonthly
  • DOI: 10.18178/IJESD
  • Editor-in-Chief: Prof. Richard Haynes
  • Managing Editor: Ms. Cherry L. Chen
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